The feature size of printed structures is one of the key parameters in XTPL revolutionary additive technology.

XTPL developed innovative printing-head and dedicated nanoinks allowing for ultraprecise deposition and obtaining designed microstructures for various applications.

What makes the XTPL solution unique is ultimate simplicity, unparalleled precision, speed & versatility. The feature size of printed structures is one of the key parameters in this revolutionary additive technology. The solution ensures micron-scale of structures (1 – 100 µm) required by many advanced industry sectors. XTPL disruptive technology works on most substrates, even ones that are flexible and not flat. We create complex numerical models and use advanced characteristics of nanoinks and printed structures. This allows us to constantly optimize our innovative solution and adapt the process of printing & deposition to different implementation requirements.


SEM image of parallel lines printed with around 3 µm width and 5 µm distance between the lines


SEM image of the printed trail with 4 µm width


SEM image of  the segment of TCF printed on the glass using silver based nanoink designed & patented by XTPL. The width of the line: 6 µm and interline distance: 500 µm.


SEM image of the pattern of XTPL logo composed from microdots deposited on the glass. Dots currently obtained on the market usually have about 50 µm, the minimum is 20 µm – while XTPL currently achieves dots with diameter of 1 um, and plans to go even below this limit.

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